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SPIE Photomask Technology 2016

SPIE Photomask Technology 2016

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09/12/2016 - 09/14/2016

San Jose McEnery Convention Center
150 West San Carlos Street
San Jose, CA 95110

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Add to Your Calendar 09-12-2016 00:00:00 09-14-2016 00:00:00 11 SPIE Photomask Technology 2016 Event Overview:2016 Conference TopicsMask Making:Mask data preparation • Substrates, materials, pellicles • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask makingAnamorphic Masks for High-NA EUV:Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/designEmerging & Alternate Mask Technologies:EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²EUV pellicles:Nanoimprint mask making • Nanoimprint mask applications • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² • Masks for flat panel displays • Masks for MEMsMask Business:Mask manufacturing control • Reticle management in the fab and mask shop • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges Exhibitor Information:The SPIE Photomask Technology Exhibition, the mask-making industry's premier event... San Jose McEnery Convention Center SPIE - The international society for optics and photonics true MM/DD/YYYY

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Event Overview:

2016 Conference Topics


Mask Making:
Mask data preparation • Substrates, materials, pellicles • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
Anamorphic Masks for High-NA EUV:
Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design
Emerging & Alternate Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
EUV pellicles:
Nanoimprint mask making • Nanoimprint mask applications • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² • Masks for flat panel displays • Masks for MEMs
Mask Business:
Mask manufacturing control • Reticle management in the fab and mask shop • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges

Exhibitor Information:

The SPIE Photomask Technology Exhibition, the mask-making industry's premier event. Join us as an exhibitor or walk the floor to meet key suppliers of mask components, software, and manufacturing equipment.

Join top companies showcasing these technologies:
 •     Mask technologies: Inspection/repair, Metrology, Cleaning
 •     Mask business
 •     EUV
 •     Nanoimprint
 •     Direct write
 •     Patterning
 •     Wafers
 •     Tools
 •     Simulation
 •     Resists and substrates
 •     Materials and etching

About SPIE:

SPIE is an international society advancing an interdisciplinary approach to the science and application of light.

The not-for-profit society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth.

Not sure if you want to exhibit at or attend the SPIE Photomask Technology 2016? See the panels below to get the information you need to make an informed decision.

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Website: http://spie.org/conferences-and-exhibitions/photomask-technology?WT.mc...
Conference/Event Dates: 09/12/2016 - 09/14/2016
Expo/Exhibit Dates: 09/12/2016 - 09/13/2016
Expo/Exhibit Hours: Mon, 10am-4pm, Reception 6-7:30pm; Tues, 10am-4pm
Classification: B2B
Primary Industry: Engineering
Other Industries: Engineering, Manufacturing
Estimated Attendance: 500
Audience: + Engineers and designers
+ Corporate managers from the industry
+ Application and product developers
+ Mask and chip designers
+ Resist chemists
+ Quality assurance specialists
+ Experts in mask infrastructure and mask integration
+ People working in emerging mask technologies
+ Microscopists from all phases of scanning microscopies
Venue: San Jose McEnery Convention Center
Venue Phone: (408) 792-4511
Venue Type: Indoor - Convention Center
Number of Exhibitors:20 (Previous Year)
Event Square Footage:1,200
Show Owner:SPIE
Show Manager:TriCord Tradeshow Services
Sponsorship Details: http://spie.org/conferences-and-exhibitions/photomask-technology/for-exhibitors/become-a-sponsor

Booth Size Booth Cost   Available Amenities
6' Table $1,470 Corp Member; $1,725 Non-Member   Electricity: Yes - Unknown Price
10' x 10' $2,615 Corp Member; $3,080 Non-Member   Water: n/a
Corner $325 per corner (applies to booths only)   Generator: n/a
  Marketing Vehicles Allowed: Call
Other Booth Sizes Available: n/a

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