2016 Conference Topics
Mask data preparation • Substrates, materials, pellicles • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
Anamorphic Masks for High-NA EUV:
Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design
Emerging & Alternate Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
Nanoimprint mask making • Nanoimprint mask applications • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² • Masks for flat panel displays • Masks for MEMs
Mask manufacturing control • Reticle management in the fab and mask shop • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
The SPIE Photomask Technology Exhibition, the mask-making industry's premier event. Join us as an exhibitor or walk the floor to meet key suppliers of mask components, software, and manufacturing equipment.
Join top companies showcasing these technologies:
• Mask technologies: Inspection/repair, Metrology, Cleaning
• Mask business
• Direct write
• Resists and substrates
• Materials and etching
SPIE is an international society advancing an interdisciplinary approach to the science and application of light.
The not-for-profit society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth.