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EVENT DATE
Sep 2016
M T W T F S S
12131415161718
EXPO DATE
Sep 2016
M T W T F S S
12131415161718

Venue

San Jose McEnery Convention Center 150 West San Carlos Street
San Jose , CA 95110
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Type: Indoor - Convention Center

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SPIE Photomask Technology 2016

San Jose McEnery Convention Center
B2B 1,200 500 20 (Previous Year)

EVENT DESCRIPTION

Event Overview:

2016 Conference Topics


Mask Making:
Mask data preparation • Substrates, materials, pellicles • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
Anamorphic Masks for High-NA EUV:
Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design
Emerging & Alternate Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
EUV pellicles:
Nanoimprint mask making • Nanoimprint mask applications • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² • Masks for flat panel displays • Masks for MEMs
Mask Business:
Mask manufacturing control • Reticle management in the fab and mask shop • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges

Exhibitor Information:

The SPIE Photomask Technology Exhibition, the mask-making industry's premier event. Join us as an exhibitor or walk the floor to meet key suppliers of mask components, software, and manufacturing equipment.

Join top companies showcasing these technologies:
 •     Mask technologies: Inspection/repair, Metrology, Cleaning
 •     Mask business
 •     EUV
 •     Nanoimprint
 •     Direct write
 •     Patterning
 •     Wafers
 •     Tools
 •     Simulation
 •     Resists and substrates
 •     Materials and etching

About SPIE:

SPIE is an international society advancing an interdisciplinary approach to the science and application of light.

The not-for-profit society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth.

Not sure if you want to exhibit at or attend the SPIE Photomask Technology 2016? See the panels below to get the information you need to make an informed decision.

EVENT CONTACTS

Sign Up for FULL Membership and Log In to access Event Contact Information.

EVENT DETAILS

Primary Industry:
Engineering
Other Industries:
Engineering, Manufacturing
Audience:
+ Engineers and designers
+ Corporate managers from the industry
+ Application and product developers
+ Mask and chip designers
+ Resist chemists
+ Quality assurance specialists
+ Experts in mask infrastructure and mask integration
+ People working in emerging mask technologies
+ Microscopists from all phases of scanning microscopies
Notes:
Show Owner:
SPIE
Sponsorship:

Exhibitor Information +

Booth Details:

Booth Size
Booth Cost
6' Table
$1,470 Corp Member; $1,725 Non-Member
10' x 10'
$2,615 Corp Member; $3,080 Non-Member
Corner
$325 per corner (applies to booths only)
Amenities
Electricity:
Yes - Unknown Price
Water:
n/a
Generator:
n/a
Marketing Vehicles Allowed:
Call
Services
n/a
Show Owner
SPIE
Show Manager
TriCord Tradeshow Services

floor plan

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