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2016 Conference Topics
Mask data preparation • Substrates, materials, pellicles • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
Anamorphic Masks for High-NA EUV:
Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design
Emerging & Alternate Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
Nanoimprint mask making • Nanoimprint mask applications • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² • Masks for flat panel displays • Masks for MEMs
Mask manufacturing control • Reticle management in the fab and mask shop • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
The SPIE Photomask Technology Exhibition, the mask-making industry's premier event. Join us as an exhibitor or walk the floor to meet key suppliers of mask components, software, and manufacturing equipment.
Join top companies showcasing these technologies:
• Mask technologies: Inspection/repair, Metrology, Cleaning
• Mask business
• Direct write
• Resists and substrates
• Materials and etching
SPIE is an international society advancing an interdisciplinary approach to the science and application of light.
The not-for-profit society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth.
Not sure if you want to exhibit at or attend the SPIE Photomask Technology 2016? See the panels below to get the information you need to make an informed decision.
|Conference/Event Dates:||09/12/2016 - 09/14/2016|
|Expo/Exhibit Dates:||09/12/2016 - 09/13/2016|
|Expo/Exhibit Hours:||Mon, 10am-4pm, Reception 6-7:30pm; Tues, 10am-4pm|
|Other Industries:||Engineering, Manufacturing|
|Audience:||+ Engineers and designers
+ Corporate managers from the industry
+ Application and product developers
+ Mask and chip designers
+ Resist chemists
+ Quality assurance specialists
+ Experts in mask infrastructure and mask integration
+ People working in emerging mask technologies
+ Microscopists from all phases of scanning microscopies
|Venue:||San Jose McEnery Convention Center|
|Venue Phone:||(408) 792-4511|
|Venue Type:||Indoor - Convention Center|
|Number of Exhibitors:||20 (Previous Year)|
|Event Square Footage:||1,200|
|Show Manager:||TriCord Tradeshow Services|
|Booth Size||Booth Cost||Available Amenities|
|6' Table||$1,470 Corp Member; $1,725 Non-Member||Electricity:||Yes||- Unknown Price|
|10' x 10'||$2,615 Corp Member; $3,080 Non-Member||Water:||n/a|
|Corner||$325 per corner (applies to booths only)||Generator:||n/a|
|Marketing Vehicles Allowed:||Call|
|Other Booth Sizes Available: n/a|
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