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EVENT DATE
Sep 2015
M T W T F S S
282930
Oct 2015
M T W T F S S
EXPO DATE
Sep 2015
M T W T F S S
282930
Oct 2015
M T W T F S S

Venue

Monterey Conference Center 1 Portola Plaza
Monterey , CA 93940
Location map
Type: Indoor - Convention Center

Partners

exhibitus success by design Remington Hotels NorthStar Express Freight

SPIE Photomask Technology 2015

Monterey Conference Center
B2B 1,200 400 20

The SPIE Photomask Technology Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry. Co-located with SPIE Scanning Microscopy 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications. 

Mask Making

+ Mask data preparation

+ Substrates and materials

+ Patterning tools and processes

+ Resist and resist processing

+ Etch techniques

+ Metrology

+ Inspection

+ Repair

+ Cleaning, contamination, and haze

+ Simulation of mask making

9-inch Glass

+ Impact of 450mm wafers on reticle and infrastructure

+ Tool developments to support larger blanks

+ Material developments

Mask Business

+ EUV mask making

+ EUV mask inspection and repair

+ EUV mask infrastructure

+ EUV mask application

+ Nanoimprint mask making

+ Nanoimprint mask application

+ Pixelated masks

+ Alternative mask technologies

+ Grey-scale masks

+ Direct-write, ML²

Exhibition Dates and Hours:

Tuesday 29 September | 10:00 am to 4:30 pm; 6:00 to 7:00 pm

Wednesday 30 September | 10:00 am to 4:00 pm

Not sure if you want to exhibit at or attend the SPIE Photomask Technology 2015? See the panels below to get the information you need to make an informed decision.

EVENT CONTACTS


Customer Service
SPIE - The international society for optics and photonics
1000 20th Steet
Bellingham, WA 98225
(360) 676-3290

EVENT DETAILS

Primary Industry:
Engineering
Other Industries:
Engineering, Manufacturing
Audience:
+ Engineers and designers
+ Corporate managers from the industry
+ Application and product developers
+ Mask and chip designers
+ Resist chemists
+ Quality assurance specialists
+ Experts in mask infrastructure and mask integration
+ People working in emerging mask technologies
+ Microscopists from all phases of scanning microscopies
Notes:
Attendee Statistics:
Show Owner:
Sponsorship:

Exhibitor Information +

Booth Details:

Booth Size
Booth Cost
6' Table
$1,425 Corp Member; $1,675 Non-Member
10' x 10'
$2,540 Corp Member; $2,990 Non-Member
10' x 10'
$325 per corner (applies to booths only)
10' x 10'
Amenities
Electricity:
Yes
Water:
n/a
Generator:
n/a
Marketing Vehicles Allowed:
Call
Services
n/a

floor plan

exhibitor list

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