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EVENT DATES
Sep 2015
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Oct 2015
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EXHIBITION HALL DATES
Sep 2015
MoTuWeThFrSaSu
 123456
78910111213
14151617181920
21222324252627
282930    
Oct 2015
MoTuWeThFrSaSu
   1234
567891011
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19202122232425
262728293031 

Venue

Monterey Conference Center One Portola Plaza Monterey , California 93940
Tel: 831646
Website
Google Map

SPIE Photomask Technology 2015

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Overview

The SPIE Photomask Technology Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry. Co-located with SPIE Scanning Microscopy 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications. 

Mask Making

+ Mask data preparation

+ Substrates and materials

+ Patterning tools and processes

+ Resist and resist processing

+ Etch techniques

+ Metrology

+ Inspection

+ Repair

+ Cleaning, contamination, and haze

+ Simulation of mask making

9-inch Glass

+ Impact of 450mm wafers on reticle and infrastructure

+ Tool developments to support larger blanks

+ Material developments

Mask Business

+ EUV mask making

+ EUV mask inspection and repair

+ EUV mask infrastructure

+ EUV mask application

+ Nanoimprint mask making

+ Nanoimprint mask application

+ Pixelated masks

+ Alternative mask technologies

+ Grey-scale masks

+ Direct-write, ML²

Exhibition Dates and Hours:

Tuesday 29 September | 10:00 am to 4:30 pm; 6:00 to 7:00 pm

Wednesday 30 September | 10:00 am to 4:00 pm

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