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SPIE Photomask Technology 2015

SPIE Photomask Technology 2015

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09/29/2015 - 10/01/2015

Monterey Conference Center
1 Portola Plaza
Monterey, CA 93940

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Paid membership required to see this information

The SPIE Photomask Technology Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry. Co-located with SPIE Scanning Microscopy 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications. 

Mask Making

+ Mask data preparation

+ Substrates and materials

+ Patterning tools and processes

+ Resist and resist processing

+ Etch techniques

+ Metrology

+ Inspection

+ Repair

+ Cleaning, contamination, and haze

+ Simulation of mask making

9-inch Glass

+ Impact of 450mm wafers on reticle and infrastructure

+ Tool developments to support larger blanks

+ Material developments

Mask Business

+ EUV mask making

+ EUV mask inspection and repair

+ EUV mask infrastructure

+ EUV mask application

+ Nanoimprint mask making

+ Nanoimprint mask application

+ Pixelated masks

+ Alternative mask technologies

+ Grey-scale masks

+ Direct-write, ML²

Exhibition Dates and Hours:

Tuesday 29 September | 10:00 am to 4:30 pm; 6:00 to 7:00 pm

Wednesday 30 September | 10:00 am to 4:00 pm

Not sure if you want to exhibit at or attend the SPIE Photomask Technology 2015? See the panels below to get the information you need to make an informed decision.

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Conference/Event Dates: 09/29/2015 - 10/01/2015
Conference/Event Hours: all day
Expo/Exhibit Dates: 09/29/2015 - 09/30/2015
Expo/Exhibit Hours: Tuesday 29 Sep- 10am to 4:30 and 6pm to 7pm/ Wednesday 30 Sep 10am to 4pm.
Classification: B2B
Primary Industry: Engineering
Other Industries: Engineering, Manufacturing
Estimated Attendance: 400
Cost to Attend:
Audience: + Engineers and designers
+ Corporate managers from the industry
+ Application and product developers
+ Mask and chip designers
+ Resist chemists
+ Quality assurance specialists
+ Experts in mask infrastructure and mask integration
+ People working in emerging mask technologies
+ Microscopists from all phases of scanning microscopies
Venue: Monterey Conference Center
Venue Phone: (831) 646-3770
Venue Type: Indoor - Convention Center
Number of Exhibitors:20
Event Square Footage:1,200
Exhibit Floorplan:Click Here

Booth Size Booth Cost   Available Amenities
6' Table $1,425 Corp Member; $1,675 Non-Member   Electricity: Yes - Unknown Price
10' x 10' $2,540 Corp Member; $2,990 Non-Member   Water: n/a
Corner $325 per corner (applies to booths only)   Generator: n/a
  Marketing Vehicles Allowed: Call
Other Booth Sizes Available: n/a

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SPIE Photomask Technology 2015

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