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EVENT DATE
Sep 2014
M T W T F S S
15161718192021
EXPO DATE
Sep 2014
M T W T F S S
15161718192021

Venue

Monterey Conference Center and Monterey Marriott 1 Portola Plaza
Monterey , CA 93940
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Type: Indoor - Hotel

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SPIE Photomask Technology 2014

Monterey Conference Center and Monterey Marriott
B2B 300

EVENT DESCRIPTION

The 34th Annual SPIE Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry.

Mask Making

+ Mask data preparation

+ Substrates and materials

+ Patterning tools and processes

+ Resist and resist processing

+ Etch techniques

+ Metrology

+ Inspection

+ Repair

+ Cleaning, contamination, and haze

+ Simulation of mask making

+ Mask process correction

Larger Glass, Smaller Fields, and Materials for 450mm

+ Impact of 450mm wafers on reticle and infrastructure

+ Tool developments to support larger blanks

+ Material developments

+ Interactions with magnifications

+ Impact of stitching for mask making and design

Emerging Mask Technologies

+ EUV mask making

+ EUV mask inspection and repair

+ EUV mask infrastructure

+ EUV mask application

+ Nano imprint mask making

+ Nano imprint mask application

+ Pixelated masks

+ Alternative mask technologies

+ Grey-scale masks

+ Direct-write, ML²

Mask Application

+ Double- and multi-patterning

+ Resolution enhancement techniques and OPC

+ Source/mask optimization

+ Design for manufacturability  

+ Patterned media  

+ Simulation and modeling
+ Inverse lithography technology

Mask Business

+ Mask manufacturing control

+ Mask shop management

+ Mask management in wafer fabs  

+ Business aspects of masks  

+ Infrastructure challenges

Don't wait to register for the SPIE Photomask Technology 2014. You'll meet influential people and maximize your opportunities for success. Start now by accessing the information below.

EVENT CONTACTS

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EVENT DETAILS

Primary Industry:
Engineering
Other Industries:
Engineering, Manufacturing
Audience:
+ Engineers and designers
+ Corporate managers from the industry
+ Application and product developers
+ Mask and chip designers
+ Resist chemists
+ Quality assurance specialists
+ Experts in mask infrastructure and mask integration
+ People working in emerging mask technologies
Notes:
Show Owner:
SPIE -The international society for optics and photonics
Sponsorship: Yes

Exhibitor Information +

Booth Details:

Booth Size
Booth Cost
Call for information.
Amenities
Electricity:
n/a
Water:
n/a
Generator:
n/a
Marketing Vehicles Allowed:
Call
Services
n/a
Show Owner
SPIE -The international society for optics and photonics
Exhibitor Prospectus

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