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SPIE Photomask Technology 2014

SPIE Photomask Technology 2014

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09/16/2014 - 09/18/2014

Monterey Conference Center and Monterey Marriott
1 Portola Plaza
Monterey, CA 93940

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Add to Your Calendar 09-16-2014 00:00:00 09-18-2014 00:00:00 11 SPIE Photomask Technology 2014 The 34th Annual SPIE Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry. Mask Making + Mask data preparation + Substrates and materials + Patterning tools and processes + Resist and resist processing + Etch techniques + Metrology + Inspection + Repair + Cleaning, contamination, and haze + Simulation of mask making + Mask process correction Larger Glass, Smaller Fields, and Materials for 450mm + Impact of 450mm wafers on reticle and infrastructure + Tool developments to support larger blanks + Material developments + Interactions with magnifications + Impact of stitching for mask making and design Emerging Mask Technologies + EUV mask making + EUV mask inspection and repair + EUV mask infrastructure + EUV mask application + Nano imprint mask making + Nano imprint mask application + Pixelated masks + Alternative mask technologies + Grey-scale masks + Direct-write, ML² Mask Application + Double- and multi-patterning + Resolution enhancement techniques and OPC + Source/mask optimization + Design for manufacturability   + Patterned media   + Simulation and modeling + Inverse lithography technology Mask Business + Mask manufacturing control + Mask shop management + Mask management in wafer fabs   + Business aspects of masks   + Infrastructure challenges Monterey Conference Center and Monterey Marriott SPIE - The international society for optics and photonics true MM/DD/YYYY

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The 34th Annual SPIE Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry.

Mask Making

+ Mask data preparation

+ Substrates and materials

+ Patterning tools and processes

+ Resist and resist processing

+ Etch techniques

+ Metrology

+ Inspection

+ Repair

+ Cleaning, contamination, and haze

+ Simulation of mask making

+ Mask process correction

Larger Glass, Smaller Fields, and Materials for 450mm

+ Impact of 450mm wafers on reticle and infrastructure

+ Tool developments to support larger blanks

+ Material developments

+ Interactions with magnifications

+ Impact of stitching for mask making and design

Emerging Mask Technologies

+ EUV mask making

+ EUV mask inspection and repair

+ EUV mask infrastructure

+ EUV mask application

+ Nano imprint mask making

+ Nano imprint mask application

+ Pixelated masks

+ Alternative mask technologies

+ Grey-scale masks

+ Direct-write, ML²

Mask Application

+ Double- and multi-patterning

+ Resolution enhancement techniques and OPC

+ Source/mask optimization

+ Design for manufacturability  

+ Patterned media  

+ Simulation and modeling
+ Inverse lithography technology

Mask Business

+ Mask manufacturing control

+ Mask shop management

+ Mask management in wafer fabs  

+ Business aspects of masks  

+ Infrastructure challenges

Don't wait to register for the SPIE Photomask Technology 2014. You'll meet influential people and maximize your opportunities for success. Start now by accessing the information below.

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Website: http://spie.org/photomask.xml?WT.mc_id=RCal-PMW...
Conference/Event Dates: 09/16/2014 - 09/18/2014
Conference/Event Hours: all day event
Expo/Exhibit Dates: 09/16/2014 - 09/17/2014
Expo/Exhibit Hours: Tuesday,16 September - 10:00am to 4:30pm; 6:30pm to 8:00pm; and Wednesday, 17 September - 10:00am to 4:00pm
Classification: B2B
Primary Industry: Engineering
Other Industries: Engineering, Manufacturing
Estimated Attendance: 300
Audience: + Engineers and designers
+ Corporate managers from the industry
+ Application and product developers
+ Mask and chip designers
+ Resist chemists
+ Quality assurance specialists
+ Experts in mask infrastructure and mask integration
+ People working in emerging mask technologies
Venue: Monterey Conference Center and Monterey Marriott
Venue Phone: (800) 742-8091
Venue Type: Indoor - Hotel
Show Owner:SPIE -The international society for optics and photonics
Exhibitor Prospectus:Click Here
Sponsorship: Yes
Sponsorship Details: http://spie.org/x32502.xml

Booth Size Booth Cost   Available Amenities
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SPIE Photomask Technology Exhibition 2014

Featured technologies:

+ Electron-beam lithography

+ EUV

+ Metrology

+ Lasers

+ Nanotechnology

+ Optical/laser microlithography

+ Resist technology and processing

+ Software

+ Electronic imaging components

AUDIENCE

+ Engineers and designers

+ Corporate managers from the industry

+ Application and product developers

+ Mask and chip designers

+ Resist chemists

+ Quality assurance specialists

+ Experts in mask infrastructure and mask integration

+ People working in emerging mask technologies

 

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SPIE Photomask Technology 2014

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