SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.
SPIE Advanced Lithography draws more than 4,000 attendees and about 50 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Advanced Etch Technology for Nanopatterning
+ Extreme Ultraviolet (EUV) Lithography
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Resist Materials and Processing Technology
+ Optical Microlithography
+ Design for Manufacturability through Design-Process Integration
Courses: Advanced Lithography 2014 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography. 2014 course lists and descriptions will be available October 2013.
Exhibition Overview: The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 35 years.
See the latest technology in advanced lithography:
+ Etch Technology for nanopatterning
+ Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
+ Metrology, inspection, OPC, and process control
+ Design and manufacturing software
+ Materials and chemicals
+ Imaging equipment
+ Resist materials and processing
+ IC and chip fabrication
+ Nanoscale imaging
SPIE is an international society advancing an interdisciplinary approach to the science and application of light.
*San Jose Marriot: 301 South Market Street / San Jose, California 95113 / 800-314-0928