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SPIE Advanced Lithography 2014

SPIE Advanced Lithography 2014

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02/23/2014 - 02/27/2014

San Jose Convention Center and San Jose Marriot*
San Jose Convention Center:
150 West San Carlos Street
San Jose, CA 95110

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Paid membership required to see this information

Paid membership required to see this information


SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

SPIE Advanced Lithography draws more than 4,000 attendees and about 50 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.

Featuring presentations on:

+ Advanced Etch Technology for Nanopatterning

+ Extreme Ultraviolet (EUV) Lithography

+ Alternative Lithographic Technologies

+ Metrology, Inspection, and Process Control for Microlithography

+ Advances in Resist Materials and Processing Technology

+ Optical Microlithography

+ Design for Manufacturability through Design-Process Integration

Courses: Advanced Lithography 2014 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography. 2014 course lists and descriptions will be available October 2013.


Exhibition Overview: The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 35 years.

See the latest technology in advanced lithography:

+ Etch Technology for nanopatterning

+ Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET

+ Metrology, inspection, OPC, and process control

+ Design and manufacturing software

+ Materials and chemicals

+ Imaging equipment

+ Lasers

+ Resist materials and processing

+ Nano-imprint

+ IC and chip fabrication

+ Nanoscale imaging 

About SPIE:

SPIE is an international society advancing an interdisciplinary approach to the science and application of light.

*San Jose Marriot: 301 South Market Street / San Jose, California 95113 / 800-314-0928

Not sure if you want to exhibit at or attend the SPIE Advanced Lithography 2014? See the panels below to get the information you need to make an informed decision.

All information in Events In America is deemed to be accurate at the time we add it, and we take steps to verify all details and update our records when new information is provided, but as people, events and circumstances change, we caution users to independently confirm all information. and Events In America LLC make no guarantee of accuracy and assume no liability for inaccurate information.

Conference/Event Dates: 02/23/2014 - 02/27/2014
Expo/Exhibit Dates: 02/25/2014 - 02/26/2014
Expo/Exhibit Hours: Tues, 10am-5pm; Wed, 10am-4pm
Classification: B2B
Primary Industry: Sciences
Other Industries: Business, Engineering, Manufacturing, Miscellaneous, Sciences, Technology
Audience: Top Researchers, Scientists, and Pioneers
Venue: San Jose Convention Center and San Jose Marriot*
Venue Phone: (800) 726-5673
Venue Type: Indoor - Convention Center
Official Conference Hotel:San Jose Marriot
Conference Hotel URL:
Exhibit Floorplan:Click Here
Show Owner:SPIE- The International Society for Optics and Photonics
Sponsorship: Yes

Booth Size Booth Cost   Available Amenities
Exhibiting is available. Call for prices.   Electricity: Yes - Unknown Price
  Water: n/a
  Generator: n/a
  Marketing Vehicles Allowed: Yes
Other Booth Sizes Available: n/a

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2014 Exhibitor List:


Sales Contact:

In Austria, Belgium, Germany, Italy, Liechtenstein, Luxembourg, Netherlands, and Switzerland – Hermann Doster

In America, Asia, and rest of the world – Teresa Roles-Meier


Speaker Information:

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SPIE Advanced Lithography 2014

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